Puls-Laser-Deposition (PLD) Anlage

Facility for large area pulsed laser deposition procedures of nanometer multilayers

Facility for large area pulsed laser deposition procedures of nanometer multilayers
© Fraunhofer IWS Dresden
Facility for large area pulsed laser deposition procedures of nanometer multilayers
Schematic diagram of the target-substrate arrangement for large-area homogenous coating
© Fraunhofer IWS Dresden
Schematic diagram of the target-substrate arrangement for large-area homogenous coating

Set-up

  • patented target-substrate moving pattern for the deposition of homogeneous layers on large surfaces
  • UHV design to synthesize highly pure layers
  • integration of a vacuum load lock for a quick sample exchange


Application

  • deposition of atomically smooth and precise nanometer single and multilayer systems (homogeneous or with targeted gradients of coating thickness)
  • deposition of substrate smoothing layers


Technical data

  • vacuum: p < 2·10-8 mbar
  • substrate: Ø = 100 mm
  • targets: 4 Stück, cylindrical
  • run-to-run reproducibility of the film thickness: 99.8 %
  • ablation laser: q-switched Nd:YAG with wavelength λ = 1064 nm, 532 nm, 355 nm and pulse length τ = 4 ... 10 ns