Surface functionalization laboratories
Laser sources
- Different ns- and ps- pulsed solid state laser systems (available wavelengths: 266, 355, 532 and 1064 nm), 0.5 to 300 W
Equipment technology
- Laser interference structuring systems (in-house development), resolution up to 150 nm, 0.9 m²/min
- CNC four-axis positioning systems (x, y, z, rotation), resolution: 0.5 µm, x/y/z scan length up to 500 mm, rotation angle: 360°.
- Reflected light microscopes, max. magnification: 150x
- Tribometer, force resolution: 0.1 µN
- White light interferometers and confocal microscopes, vertical resolution: up to 0.1 nm, La-teral resolution: up to 140 nm
- Roll to roll UV/Hot embossing system, film width up to 300 mm, up to 50 m/min (TU Dresden)
- AI-Testbench – Predictive modeling for laser precision manufacturing: Combining micromaterial processing with artificial intelligence and machine learning.