Fraunhofer Institute for Material and Beam Technology IWSPVD (physical vapor deposition) processes allow the deposition of high-quality tribological and functional layers in the range of thicknesses from a few nanometers to several tens of micrometers. IWS facilities include various technologies such as high-rate evaporation and highly activated plasma processes as ell as their combinations. A particular focus is placed on the extensive use of arc discharges as the most effective source of energetic vapor jets.