Components for Coating Systems

Eletromagnetic Arc Spot Control ProArc

Different arc spot trajectories on a rectangular cathode.
© Fraunhofer IWS
Different arc spot trajectories on a rectangular cathode.

The movement of the cathodic arc spots on the cathode has a significant influence on the process reliability and the effectiveness of the arc PVD process. Their targeted control is possible with the ProArc system ("programmable arc"). Particularly when large-area cathodes are used, the effectiveness and quality of vacuum arc coating can be significantly improved. This system offers significant advantages in particular with regard to:

  • Cathode utilization
  • Coating thickness profile and homogeneity
  • Plasma characteristics
  • Process stability

The control of the arc spot movement is realized via a programmable magnetic field and can generate different arc spot paths within fractions of a second.

Plasma Filtering with Lamella Filter

Electromagnetic particle filter for the vacuum arc coating.
© Fraunhofer IWS
Electromagnetic particle filter for the vacuum arc coating.

Vacuum arc evaporators emit highly ionized plasma and microscopic particles (droplets) of the cathode material. For certain applications, these interfere and must be filtered out of the plasma. One possibility for filtering is offered by the lamellar filter.

A compact filter module was developed on the basis of a lamella filter. This combines geometric shading with electromagnetic plasma guidance. The lamellae are mounted in front of the cathode of the arc evaporator, so that the filter shields the evaporator from the substrate like a louver. Droplets emitted from the cathode stick to the filter. A current flow through the lamella creates a magnetic field between them and forces the arc plasma through the gaps between the lamellae. After passing through the filter module, it can form particle-free layers on the substrates.

Plasma Cleaning in a Continuous Process

Principle of arc-enhanced glow discharge cleaning in a continuous process.
© Fraunhofer IWS
Principle of arc-enhanced glow discharge cleaning in a continuous process.
Arc-supported plasma cleaning in operation. The arc plasma below and the argon plasma above the shutter are clearly visible.
© Fraunhofer IWS
Arc-supported plasma cleaning in operation. The arc plasma below and the argon plasma above the shutter are clearly visible.

The coating of substrates of all kinds with PVD or CVD processes generally requires pretreatment of the surfaces in a vacuum with suitable plasma processes. The treatment of strip material (e.g. steel strip) in a continuous process, for example, presents special challenges. Extremely large surfaces have to be cleaned continuously. For this purpose a plasma based cleaning module was developed at the IWS.

The implemented cleaning technology for plasma cleaning in vacuum is a further development of the proven AEGD process (AEGD: Arc-Enhanced Glow Discharge). In this process, a cathodic arc discharge is used as the electron source, whereby the arc cathode is separated from the substrate by a shutter. With the aid of an additional anode near the substrate, the argon gas present is ionized and a dense argon plasma is available for cleaning the substrate.