Fraunhofer Institute for Material and Beam Technology IWSFacility for large area pulsed laser deposition procedures of nanometer multilayers
Facility for large area pulsed laser deposition procedures of nanometer multilayers
Schematic diagram of the target-substrate arrangement for large-area homogenous coating
Set-up
- patented target-substrate moving pattern for the deposition of homogeneous layers on large surfaces
- UHV design to synthesize highly pure layers
- integration of a vacuum load lock for a quick sample exchange
Application
- deposition of atomically smooth and precise nanometer single and multilayer systems (homogeneous or with targeted gradients of coating thickness)
- deposition of substrate smoothing layers
Technical data
- vacuum: p < 2·10-8 mbar
- substrate: Ø = 100 mm
- targets: 4 Stück, cylindrical
- run-to-run reproducibility of the film thickness: 99.8 %
- ablation laser: q-switched Nd:YAG with wavelength λ = 1064 nm, 532 nm, 355 nm and pulse length τ = 4 ... 10 ns