Fraunhofer Institute for Material and Beam Technology IWSFor coating and technology development as well as sample and small series coating, systems for arc coating (classic dc-Arc, puls-Arc), electron beam evaporation, sputter coating and hybrid coating processes are available. These systems can be used to perform a wide range of different coating tasks.
PVD Technologies and Equipment
PVD coating line MZR 323 for industrial hard coating
Technical Data
- Usable chamber volume: Ø 450 mm x 500 mm
- Three evaporators for Arc PVD coating (coating with highly ionized plasma),
- Plasma pretreatment device
Applications
- Deposition of metals, various metal compounds (nitrides, oxides, carbonitrides, nanocomposites) for R&D purposes, experimental small series etc.
- Process and coating development for the realization of customer-specific coating solutions
Small PVD coating system MR 313 for experimental hard coating.
Technical Data
- Usable chamber volume: 400 mm x 400 mmm x 400 mm
- Two evaporators for Arc PVD coating (coating with highly ionized plasma)
- Sputter coating source (coating with low ionized plasma)
- Plasma pretreatment device
Applications
- Deposition of metals, various metal compounds (nitrides, oxides, carbonitrides, nanocomposites) for R&D purposes, deposition of particularly thick PVD layers (>100 µm)
- Development of coating sources (e.g. magnetically controlled arc sources)
- Process development for the deposition of innovative coating materials
Combination coating system OLGA for research into hybrid PVD processes (e.g. electron beam + vacuum arc) for high-rate deposition of a wide variety of coating materials.
Technical Data
- Usable chamber volume: Ø 1200 mm x 900 mm
- Electron beam gun (40 kW) for vapor deposition (Coating with thermal vapor)
- Two evaporators for Arc PVD coating (Coating with highly ionized plasma) and for combination with the vapor deposition process
- Plasma pretreatment device
Applications
- Deposition of metals and many other materials at high rates for R&D purposes, Deposition of particularly thick PVD layers (> 1 mm)
- Development of combination processes (vapor deposition process +X)
Simulation of arc coating processes.
Simulation Tools for Modeling
- Of cathode processes during arc evaporation
- Of the plasma propagation in the coating chamber
- Of layer thickness distribution on real component geometries
The tools are under development and some of them are already available for modeling tasks.