Vacuum Arc coating (MR 313)

Vacuum arc coating: industrial small plant MR 313

Vacuum arc coating: industrial small plant MR 313
© Fraunhofer IWS
Vacuum arc coating: industrial small plant MR 313
TiN coating of a stereo lithography - model (TU Dresden)
© Fraunhofer IWS
TiN coating of a stereo lithography - model (TU Dresden)

Manufacturer

  • Metaplas Ionon, Bergisch-Gladbach / von Ardenne Anlagentechnik, Dresden


Coating process

  • Vacuum arc coating with round and square cathode
  • sputter coating


Specifications

  • Chamber: cubic, useful volume 0.4 m x 0.4 m x 0.4 m
  • Vacuum system: diffusion pump
  • Ultimate vacuum of <10-4 Pa (after 60 min)
  • carrier: rotating (simple and planetary), various special carriers


Technological options

  • DC - vacuum arc evaporation (I = 150 A)
  • Two evaporators for alternate or simultaneous operation
  • Setting defined  erosion- and depositions profiles (Pro Arc) by programmable focal spot control
  • Sputter coating
  • Reactive deposition with max. four process gases possible
  • Device for plasma cleaning:
    - Conventional glow discharge cleaning
    - Arc-enhanced glow discharge (AEGD)


Applications

  • Deposition of nitride hard materials such as TiN, CrN, ZrN, TiAlN
  • Metallization (separation nearly all metals available)
  • Process engineering and development of vacuum arc coating, sputter coating
  • Development of new plasma sources (pulse arc)