Reactive multilayer systems

Technologies

Magnetron sputtering

Multi-Sputter-Lab 600 (MSL600)
© Fraunhofer IWS Dresden
Multi-Sputter-Lab 600 (MSL600)
Schematics of the Multi-Sputter-Lab 600 (MSL600)
© Fraunhofer IWS Dresden
Schematics of the Multi-Sputter-Lab 600 (MSL600)

Reactive multilayer systems (RMS) are created using PVD processes such as magnetron sputtering.


Advantages

Magnetron sputtering in particular offers the advantages of precisely controlled fabrication and the possibility of upscaling for high volumes. With the Multi-Sputter-Lab 600 (MSL600) it is possible to produce standardized free-standing RMS layers for mobile applications as well as to coat components with full-surface or structured coatings.


Multi-Sputter-Lab 600 (MSL600)

The MSL600 is equipped with four magnetron coating sources, which can be operated with powers of up to 10 kW, and two substrate cleaning stations. In addition to RMS deposition, it is thus possible to carry out pre-cleaning steps such as glowing or ion beam etching as well as the deposition of solder and wetting layers.

Up to five components or RMS with dimensions of up to 430 x 220 mm2 can be homogeneously coated on a 6-fold polygon substrate carrier arranged centrally to the coating sources. At maximum capacity, RMS with a surface area of up to 950 cm2 can thus be produced homogeneously in one pass. A substrate cooling system ensures reliable cooling of the components to be coated as well as a high energy yield of the produced RMS.


Concept

Layer deposition is performed by a uniform rotation of the polygon carrier in front of the coating sources. The desired thicknesses of the single layers are adjusted in the range from 2 nm to several hundred nanometers by scaling the power supply.