Fraunhofer Institute for Material and Beam Technology IWSLaboratory for surface functionalization
Laser interference system
Development of complete DLIP systems for industrial use
Compact DLIP system solutions that can be integrated into existing systems (axis-based direct laser interference structuring, galvanometer scanner-based direct laser interference structuring)
Applications
- fabrication of micro- and sub-micrometer sized surface structures on polymers, metals, ceramics and other coatings
- fabrication of 1-, 2- and 3-dimensional periodic structures on large, plane as well as non plane complex parts
- laser interference lithography and two photon polymerization of photosensitive materials
Process equipment
- unit for laser interference structuring (proprietary development), resolution up to 150 nm, 0.7 m²/min
- different ns- and ps-pulsed solid state laser systems (available wave lengths: 266, 355, 532 and 1064 nm), 0.5 to 190 W
- two photon polymerization system (proprietary development) with 100 nm resolution
- CNC-four-axes positioning systems (x, y, z, rotation), resolution: 0.5 µm, x/y/z-scan length up to 500 mm, rotation angle: 360°
- reflected-light microscopes, max. magnification: 1000 x
- tribometer, force resolution: 0.1 N
- white light interferometer and confocal microscopes, vertical resolution: up to 0.1 nm, lateral resolution: up to 140 nm
- roll-to-roll UV/Hot Embossing System, film width up to 300 mm, up to 50 m/min /TU Dresden)