
Ion beam cross section polisher for preparation of sharp edge cross section samples

Ion beam system PIPS 691 for preparation of TEM specimen

Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope
Equipment
- Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope JIB-4610F (Fa. JEOL)
- Electrolytic thinning system: Struers Tenupol-3
- Electrolytic polishing and etching system: PoliMat 2
- Ion beam cross section polisher: JEOL IB09010CP
- Ion beam polishing systems: PIPS 691, PIPS 695
Methods
- „Microfabrication“ / „Nanofabrication“ via focused ion beam: production of diverse geometric structures, typical volumes: 10 µm3, typical precision: 10 nm
- Effective, low-damage high-precision target-preparation of different materials (metal, synthetic material, composite, layer, nanomaterials) for TEM analysis
- Effective treatment of large surfaces and volumes with ion-ablation with an ion-current up to 90nA
- Preparation of deformation-free and sharp edge cross section samples for SEM and EDX analytics
- Preparation of heterogeneous materials, complex thin film systems, modified surface zones and welding interfaces
- Electrolytic polishing and etching of metallic materials