Fraunhofer Institute for Material and Beam Technology IWS
Ion beam cross section polisher for preparation of sharp edge cross section samples
Ion beam system PIPS 691 for preparation of TEM specimen
Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope
Equipment
- Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope JIB-4610F (Fa. JEOL)
- Electrolytic thinning system: Struers Tenupol-3
- Electrolytic polishing and etching system: PoliMat 2
- Ion beam cross section polisher: JEOL IB09010CP
- Ion beam polishing systems: PIPS 691, PIPS 695
Methods
- „Microfabrication“ / „Nanofabrication“ via focused ion beam: production of diverse geometric structures, typical volumes: 10 µm3, typical precision: 10 nm
- Effective, low-damage high-precision target-preparation of different materials (metal, synthetic material, composite, layer, nanomaterials) for TEM analysis
- Effective treatment of large surfaces and volumes with ion-ablation with an ion-current up to 90nA
- Preparation of deformation-free and sharp edge cross section samples for SEM and EDX analytics
- Preparation of heterogeneous materials, complex thin film systems, modified surface zones and welding interfaces
- Electrolytic polishing and etching of metallic materials