UHV clustertool

UHV cluster tool to synthesize precise nanometer multilayer systems by MSD and PLD procedures

UHV clustertool for generating precision nanometer multilayer systems
© Fraunhofer IWS Dresden

UHV clustertool for generating precision nanometer multilayer systems

UHV hybrid system consisting of

  • coating chamber for pulsed laser deposition processes (PLD)
  • chamber for magnetron sputter deposition (MSD)
  • central handling system
  • sample load lock
  • sample magazine

Technical data

General information

  • vacuum: p < 2·10-8 mbar
  • substrate: Ø = 150 mm, m = 5 kg
  • targets: 4 in each chamber
  • run-to-run reproducibility of the layer thickness: 99.8 %

PLD

  • ablation laser: q-switched Nd:YAG with the wavelength λ = 1064 nm, 532 nm, 355 nm and pulse length τ = 4 ... 10 ns

MSD

  • sputtering modi: DC and RF
  • typical working pressure: pA r ≥ 7 ·10-4 mbar
  • target-substrate distance: 50 ... 100 mm

Typical layer characteristics

  • layer thickness: 0,2 ... 500 nm
  • very low roughness in the range of 0.15 ... 0.3 nm
  • uniformity: 99.5 - 99.9 % more than 150 mm

Some results

  • MSD: Mo/Si multilayers with X-ray reflections of 70 % (wavelength λ = 13.5 nm, incidence angle α = 1,5 °)
  • PLD: Ni/C multilayers with dP = 3.25 nm and RCu-Kα = 73 %