PVD (physical vapor deposition) processes allow the deposition of high-quality tribological and functional layers in the range of thicknesses from a few nanometers to several tens of micrometers. IWS facilities include various technologies such as high-rate evaporation and highly activated plasma processes as ell as their combinations. A particular focus is placed on the extensive use of arc discharges as the most effective source of energetic vapor jets.
© Fraunhofer IWS Dresden
Hard coatings with > 100 microns thickness
These layers are suitable for the protection of extremely stressed surfaces of tools and components. The image shows the cross section of a 130 micron thick layer of hard material on Al-Cr-Si-Ti-N-base, which was prepared by the arc process.