Large Area Pulsed Laser Deposition (PLD)
Working with PLD allows the deposition of homogenous, (multilayer-) thin films with variable density. Their thickness can be controlled in the nanometer range. By doing so, the Fraunhofer IWS can look back on many years of experience in the field of X-ray and EUV-optic-applications where precision and controlling of layer thickness plays a key role.
The creation of a new layer stack is primarily based on the laser-target-interaction. With the impingement of the laser beam on the targets surface a plasma torch is produced. It consists of a mixture of atoms, ions, clusters, electrons and photons. The condensation of target material on the substrates surface finally leads to the growth of the desired thin film.
With the help of a uniquely designed target to substrate-positioning, in combination with the option of substrate movement during deposition, the Fraunhofer IWS is able to deposit thin films homogenously onto a substrate size of up to 6”.
- stoichiometric material deposition from target to substrate
- small target sizes can be used (e.g. pressed or sintered tablets)
- variable deposition rates
- controllable density of the thin films
- deposition of amorphous structures possible
- deposition with mask-technologies
- deposition under reactive atmosphere (different gas pressures)
- substrate sizes up to 6” possible