Preparation techniques for electron microscopy

Ion beam cross section polisher for preparation of sharp edge cross section samples
© Frank Höhler
Ion beam cross section polisher for preparation of sharp edge cross section samples
Ion beam system PIPS 691 for preparation of TEM specimen
© Fraunhofer IWS Dresden
Ion beam system PIPS 691 for preparation of TEM specimen
Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope
© Frank Höhler
Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope

Equipment

  • Analytic dual-beam-system: Focused Ion Beam and scanning electron microscope JIB-4610F (Fa. JEOL)
  • Electrolytic thinning system: Struers Tenupol-3
  • Electrolytic polishing and etching system: PoliMat 2
  • Ion beam cross section polisher: JEOL IB09010CP
  • Ion beam polishing systems: PIPS 691, PIPS 695


Methods

  • „Microfabrication“ / „Nanofabrication“ via focused ion beam: production of diverse geometric structures, typical volumes: 10 µm3, typical precision: 10 nm
  • Effective, low-damage high-precision target-preparation of different materials (metal, synthetic material, composite, layer, nanomaterials) for TEM analysis
  • Effective treatment of large surfaces and volumes with ion-ablation with an ion-current up to 90nA
  • Preparation of deformation-free and sharp edge cross section samples for SEM and EDX analytics
  • Preparation of heterogeneous materials, complex thin film systems, modified surface zones and welding interfaces
  • Electrolytic polishing and etching of metallic materials