Fraunhofer Institute for Material and Beam Technology IWSEquipment in the area of chemical surface technology
Anlage zur AP-CVD
Beweglicher AP-CVD-Beschichtungskopf zur Abscheidung auf Substratgrößen bis 300 x 300 mm2
Coating machines
Chemical vapor deposition at atmospheric pressure (AP-CVD)
- 2 systems for the deposition of metal oxide thin films on substratesof up to 300 x 300 mm2
- System for the plasma activated deposition of thin films or plasmapretreatment of substrates up to 100 x 100 mm2
- System for the thermal deposition of carbon nanotubes on substrates upto 70 x 400 mm2
Liquid phase coating
- Roll-to-roll coating of foils with deposition via rolling squeegee,3 m drying line and possibility to compact and smoothen by calendering(250 kN); line width of up to 280 mm
- Dip coater to apply thin films on substrates up to 300 x 300 mm2
- Spray coater (ultrasonic or airbrush) to deposit thin films onsubstrate up to 300 x 300 mm2
Material preparation
To prepare solid materials, pastes anddispersions the following equipment is available:
- Glove box an chemical hoods
- Dispersing processes (ultrasonic, mills, stirrers)
- Furnaces (muffle kiln, rotating reactor oven, dry cabinet)
Measurement techniques
Several apparatuses are available toelectrochemically characterize battery and supercap electrodes:
- temperature test cabinet
- 2 channel battery tester (large cells)
- 4 channel potentiostat
- 32 channel battery tester (test cells)