Equipment

Equipment in the area of chemical surface technology

Anlage zur AP-CVD
© Photo Fraunhofer IWS Dresden

Anlage zur AP-CVD

Beweglicher AP-CVD-Beschichtungskopf zur Abscheidung auf Substratgrößen bis 300 x 300 mm2
© Photo Fraunhofer IWS Dresden

Beweglicher AP-CVD-Beschichtungskopf zur Abscheidung auf Substratgrößen bis 300 x 300 mm2

Coating machines

Chemical vapor deposition at atmospheric pressure (AP-CVD)

  • 2 systems for the deposition of metal oxide thin films on substratesof up to 300 x 300 mm2
  • System for the plasma activated deposition of thin films or plasmapretreatment of substrates up to 100 x 100 mm2
  • System for the thermal deposition of carbon nanotubes on substrates upto 70 x 400 mm2

Liquid phase coating

  • Roll-to-roll coating of foils with deposition via rolling squeegee,3 m drying line and possibility to compact and smoothen by calendering(250 kN); line width of up to 280 mm
  • Dip coater to apply thin films on substrates up to 300 x 300 mm2
  • Spray coater (ultrasonic or airbrush) to deposit thin films onsubstrate up to 300 x 300 mm2

Material preparation

To prepare solid materials, pastes anddispersions the following equipment is available:

  • Glove box an chemical hoods
  • Dispersing processes (ultrasonic, mills, stirrers)
  • Furnaces (muffle kiln, rotating reactor oven, dry cabinet)

Measurement techniques

Several apparatuses are available toelectrochemically characterize battery and supercap electrodes:

  • temperature test cabinet
  • 2 channel battery tester (large cells)
  • 4 channel potentiostat
  • 32 channel battery tester (test cells)