Chemical Surface and Reaction Technology

Fraunhofer IWS

New technologies improve the functionality of surfaces

  • Plasma- and reaction technology

    At the Fraunhofer IWS we develop prototype pass through reactors with gas locks for deposition of oxide and non-oxide coatings and for plasma chemical etching at atmospheric pressure.

  • Process monitoring

    gefalteter Strahlengang einer kompakten Meßzelle zur Spurengasdetektion

    The scientists focus their research on the development of optical-spectroscopical measuring technologies to characterize and to monitor gas phase processes by ppb trace gas, multi gas and aerosol analytics. Process studies as well as the development of analyzers and their process implementation are here of main interest. Additionally we offer characterization methods for porous substances as well as methods for layer and surface characterizations.

  • Chemical surface technology

    PMMA-Scheibe mit integrierter CNT-Schicht

    The group develops chemical vapor and liquid phase processes for a uniform deposition of new materials on large surface areas. The work focuses on transparent functional thin films and porous carbon coatings for electric storage.

Publications